PS

Peter De Schepper

IV Imec Vzw: 1 patents #18 of 98Top 20%
KR Katholieke Universiteit Leuven, Ku Leuven R&D: 1 patents #15 of 93Top 20%
Overall (2016): #266,889 of 481,213Top 60%
1
Patents 2016

Issued Patents 2016

Patent #TitleCo-InventorsDate
9520298 Plasma method for reducing post-lithography line width roughness Jean-Francois de Marneffe, Efrain Altamirano Sanchez 2016-12-13