ES

Efrain Altamirano Sanchez

IV Imec Vzw: 1 patents #18 of 98Top 20%
KR Katholieke Universiteit Leuven, Ku Leuven R&D: 1 patents #15 of 93Top 20%
📍 Kessel-Lo, BE: #5 of 19 inventorsTop 30%
Overall (2016): #411,220 of 481,213Top 90%
1
Patents 2016

Issued Patents 2016

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9520298 Plasma method for reducing post-lithography line width roughness Peter De Schepper, Jean-Francois de Marneffe 2016-12-13