Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9280051 | Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layer | Banqiu Wu, Ajay Kumar, Omkaram Nalamasu | 2016-03-08 |