Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9305476 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Daniel Hernandez Castillo, II, Jae-ouk Choo +6 more | 2016-04-05 |
| 9305806 | Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications | Xiaobo Shi, Krishna P. Murella, Jae-ouk Choo | 2016-04-05 |