Jonathan Rullan

TL Tokyo Electron Limited: 1 patents #261 of 712Top 40%

📍 Clifton Park, NY: #67 of 183 inventorsTop 40%

🗺 New York: #3,659 of 10,473 inventorsTop 35%

Overall (2011): #257,740 of 364,097Top 75%

Patents 2011

Issued Patents 2011

Showing 1–1 of 1 patents

Patent #	Title	Co-Inventors	Date
7884012	Void-free copper filling of recessed features for semiconductor devices	Kenji Suzuki, Tadahiro Ishizaka, Miho Jomen	2011-02-08