AM

Aelan Mosden

TL Tokyo Electron Limited: 1 patents #261 of 712Top 40%
📍 Albany, NY: #31 of 80 inventorsTop 40%
🗺 New York: #3,659 of 10,473 inventorsTop 35%
Overall (2011): #361,136 of 364,097Top 100%
1
Patents 2011

Issued Patents 2011

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7959970 System and method of removing chamber residues from a plasma processing system in a dry cleaning process Marcel Gaudet, Robert J. Soave 2011-06-14