Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8067516 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | Minoru Iijima | 2011-11-29 |
| 8030419 | Process for producing polymer for semiconductor lithography | Ichiro Kato, Satoshi Yamaguchi, Kouzo Osaki, Yasuo Shibata, Isao Magara +2 more | 2011-10-04 |
| 7972762 | Positive resist composition and method of forming resist pattern | Masaaki Muroi, Kota Atsuchi, Takahiro Nakamura, Masakazu Yamada, Kensuke Saisyo +2 more | 2011-07-05 |
| 7960494 | Copolymer for semiconductor lithography and process for producing the same | Masaaki Kudo, Satoshi Yamaguchi | 2011-06-14 |
| 7910282 | Copolymer for semiconductor lithography and producing method thereof, and composition | Takayoshi Okada, Satoshi Yamaguchi, Kiyomi Miki | 2011-03-22 |