Issued Patents 2011
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8084872 | Overlay mark, method of checking local aligmnent using the same and method of controlling overlay based on the same | — | 2011-12-27 |
| 8076758 | Wafer structure | — | 2011-12-13 |
| 8049345 | Overlay mark | Chih-Hao Huang | 2011-11-01 |
| 8012675 | Method of patterning target layer on substrate | — | 2011-09-06 |
| 7998826 | Method of forming mark in IC-fabricating process | — | 2011-08-16 |
| 7952213 | Overlay mark arrangement for reducing overlay shift | Chun-Chung Huang | 2011-05-31 |
| 7939225 | Mask for controlling line end shortening and corner rounding arising from proximity effects | Chiao-Wen Yeh, Chih-Haw Huang | 2011-05-10 |
| 7927960 | Method of improving overlay performance in semiconductor manufacture | Chih-Hao Huang | 2011-04-19 |
| 7923175 | Photomask structure | Chun-Chung Huang | 2011-04-12 |
| 7901872 | Exposure process and photomask set used therein | Chih-Hao Huang | 2011-03-08 |
| 7880274 | Method of enabling alignment of wafer in exposure step of IC process after UV-blocking metal layer is formed over the whole wafer | — | 2011-02-01 |
| 7862986 | Patterning process | — | 2011-01-04 |