Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6846949 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | Toshiyuki Ogata, Kotaro Endo | 2005-01-25 |
| 6838229 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same | Yasushi Washio, Koji Saito, Toshiki Okui | 2005-01-04 |