Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6936408 | Partially photoexposed positive photoresist layer blocking method for regio-selectively processing a microelectronic layer | Yong-Shun Liao, Juing-Yi Wu, Zhen-Cheng Chou | 2005-08-30 |
| 6929713 | In-situ photoresist removal by an attachable chamber with light source | Chiang-Jen Peng | 2005-08-16 |
| 6861376 | Photoresist scum free process for via first dual damascene process | Ruei-Je Shiu, Juei-Kuo Wu | 2005-03-01 |