CL

Cheng-Ming Lin

TSMC: 2 patents #106 of 851Top 15%
Overall (2005): #60,672 of 245,428Top 25%
2
Patents 2005

Issued Patents 2005

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6905802 Multiple exposure method for forming a patterned photoresist layer — 2005-06-14
6872496 AlSixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography — 2005-03-29