Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6962878 | Method to reduce photoresist mask line dimensions | Yih-Chen Su | 2005-11-08 |
| 6878646 | Method to control critical dimension of a hard masked pattern | Jia-Sheng Wu, Fuxuan Fang | 2005-04-12 |