Issued Patents 2005
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6953649 | Photosensitive composition for photoresist manufacture | Evelyne Prat | 2005-10-11 |
| 6933340 | Formulation comprising an ionic compound, a polyionic polymer, and a block copolymer | Pascal Herve, Olivier Anthony, Bruno Bavouzet, Mathieu Joanicot, Agnieszka Zofia Wilczewska | 2005-08-23 |
| 6916884 | Method for block polymer synthesis by controlled radical polymerization in the presence of a disulphide compound | — | 2005-07-12 |
| 6906128 | Method for depositing a polymer onto a surface by applying a composition onto said surface | Natalie Cadena, Pascal Herve, Agnieszka Zofia Wilczewska | 2005-06-14 |
| 6890980 | Synthesis of block polymers obtained by controlled free radical polymerization | Frederic Leising, Alex Dureault, Daniel Taton, Yves Gnanou, Ramiro Guerrero-Santos | 2005-05-10 |
| 6858696 | Method for synthesis of hybrid silicon and organic copolymers by controlled free radical polymerization | Gerard Mignani, Samir Zard, Béatrice Sire, Chakib Kalai | 2005-02-22 |