Issued Patents 2005
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972417 | Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons | Wakako Suganuma, Sumito Shimizu, Atsushi Yamada, Hajime Yamamoto | 2005-12-06 |