Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6974658 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | Naomi Shida, Takuya Naito | 2005-12-13 |
| 6959986 | Liquid ink and recording apparatus | Chiaki Tanuma, Kazuhiko Ohtsu, Ryozo Akiyama, Masashi Hiroki, Yoshito Endo | 2005-11-01 |