HY

Hisao Yoshimura

KT Kabushiki Kaisha Toshiba: 1 patents #604 of 1,959Top 35%
📍 Tokyo, NY: #21 of 36 inventorsTop 60%
Overall (2005): #187,354 of 245,428Top 80%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6869867 SEMICONDUCTOR DEVICE COMPRISING METAL SILICIDE FILMS FORMED TO COVER GATE ELECTRODE AND SOURCE-DRAIN DIFFUSION LAYERS AND METHOD OF MANUFACTURING THE SAME WHEREIN THE SILICIDE ON GATE IS THICKER THAN ON SOURCE-DRAIN Katsura Miyashita, Mariko Takagi 2005-03-22