Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6857434 | CMP slurry additive for foreign matter detection | Kwong Hon Wong, Karl E. Boggs, Raphael Mitchell | 2005-02-22 |
| 6837777 | Wafer edge cleaning utilizing polish pad material | Donald J. Delehanty, Raymond M. Khoury, Jose M. Ocasio | 2005-01-04 |