RG

Rainer E. Gehres

IBM: 1 patents #1,781 of 5,214Top 35%
📍 Wallkill, NY: #5 of 7 inventorsTop 75%
🗺 New York: #2,313 of 8,003 inventorsTop 30%
Overall (2005): #119,761 of 245,428Top 50%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6967375 Reduction of chemical mechanical planarization (CMP) scratches with sacrificial dielectric polish stop George R. Goth 2005-11-22