Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6979658 | Method of fabricating a semiconductor device containing nitrogen in a gate oxide film | — | 2005-12-27 |
| 6894369 | Semiconductor device having a high-dielectric gate insulation film and fabrication process thereof | Yusuke Morisaki, Yoshihiro Sugita, Yoshiaki Tanida, Yoshihisa Iba | 2005-05-17 |