Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6980277 | Immersion photolithography system and method using inverted wafer-projection optics interface | — | 2005-12-27 |
| 6977716 | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage | Jorge Ivaldi, John Shamaly | 2005-12-20 |
| 6972830 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system | — | 2005-12-06 |
| 6967712 | Apparatus and system for improving phase shift mask imaging performance and associated methods | — | 2005-11-22 |
| 6967713 | Use of multiple reticles in lithographic printing tools | Andrew W. McCullough, Christopher Mason, Louis John Markoya | 2005-11-22 |