MM

Melvin Montgomery

Applied Materials: 2 patents #145 of 719Top 25%
📍 New Windsor, NY: #3 of 13 inventorsTop 25%
🗺 New York: #1,066 of 8,003 inventorsTop 15%
Overall (2005): #43,014 of 245,428Top 20%
2
Patents 2005

Issued Patents 2005

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6969569 Method of extending the stability of a photoresist during direct writing of an image Cecilia Annette Montgomery 2005-11-29
6931619 Apparatus for reshaping a patterned organic photoresist surface Alex Buxbaum 2005-08-16