Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6943053 | System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes | — | 2005-09-13 |
| 6933243 | High selectivity and residue free process for metal on thin dielectric gate etch application | Meihua Shen, Yan Du, Nicolas Gani, Oranna Yauw | 2005-08-23 |