HL

Hungtse Lin

TSMC: 2 patents #100 of 898Top 15%
📍 Luzhu District, TW: #1 of 15 inventorsTop 7%
Overall (2004): #61,215 of 270,089Top 25%
2
Patents 2004

Issued Patents 2004

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6818533 Epitaxial plasma enhanced chemical vapor deposition (PECVD) method providing epitaxial layer with attenuated defects Sheng-Hsiung Chen, Shun-Long Chen, Ming-Shing Tsai, Lan-Chieh Shih 2004-11-16
6730580 Silicon substrate wafer fabrication method employing halogen gettering material and/or plasma annealing Sheng-Hsiung Chen, Shun-Long Chen, Naite Chen 2004-05-04