Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6720268 | Method for anisotropic plasma etching of semiconductors | Franz Laermer | 2004-04-13 |
| 6720273 | DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUT PUT OR ADJUSTING THE SAME UPWARDS | Volker Becker, Franz Laermer, Thomas Beck | 2004-04-13 |
| 6709546 | Device and method for etching a substrate by using an inductively coupled plasma | Klaus Breitschwerdt, Volker Becker, Franz Laermer | 2004-03-23 |