SS

Sujit Sharan

Micron: 20 patents #18 of 948Top 2%
Applied Materials: 1 patents #235 of 720Top 35%
IN Intel: 1 patents #813 of 2,313Top 40%
📍 Chandler, AZ: #1 of 296 inventorsTop 1%
🗺 Arizona: #1 of 2,283 inventorsTop 1%
Overall (2004): #178 of 270,089Top 1%
21
Patents 2004

Issued Patents 2004

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
6835654 Methods of forming an electrically conductive line Gurtej S. Sandhu 2004-12-28
6822299 Boron-doped titanium nitride layer for high aspect ratio semiconductor devices Ammar Derraa, Paul Castrovillo 2004-11-23
6815344 Methods of forming an electrically conductive line Gurtej S. Sandhu 2004-11-09
6812512 Integrated circuit having self-aligned CVD-tungsten/titanium contact plugs strapped with metal interconnect and method of manufacture Kirk D. Prall, Howard E. Rhodes, Gurtel Sandhu, Philip J. Ireland 2004-11-02
6800517 Methods of forming conductive interconnects Gurtej S. Sandhu, Trung T. Doan, Howard E. Rhodes, Philip J. Ireland, Martin C. Roberts 2004-10-05
6791149 Diffusion barrier layer for semiconductor wafer fabrication Ammar Derraa, Paul Castrovillo 2004-09-14
6777330 Chemistry for chemical vapor deposition of titanium containing films Howard E. Rhodes, Philip J. Ireland, Gurtej S. Sandhu 2004-08-17
6773502 Method of forming a crystalline phase material Gurtej S. Sandhu 2004-08-10
6759306 Methods of forming silicon dioxide layers and methods of forming trench isolation regions Gurtej S. Sandhu 2004-07-06
6756088 Methods of forming coatings on gas-dispersion fixtures in chemical-vapor-deposition systems 2004-06-29
6756293 Combined gate cap or digit line and spacer deposition using HDP Weimin Li, Gurtej S. Sandhu 2004-06-29
6750089 Methods of forming conductive interconnects Gurtej S. Sandhu, Trung T. Doan, Howard E. Rhodes, Philip J. Ireland, Martin C. Roberts 2004-06-15
6749717 Device for in-situ cleaning of an inductively-coupled plasma chambers Gurtej S. Sandhu 2004-06-15
6746952 Diffusion barrier layer for semiconductor wafer fabrication Ammar Derraa, Paul Castrovillo 2004-06-08
6737328 Methods of forming silicon dioxide layers, and methods of forming trench isolation regions Gurtej S. Sandhu 2004-05-18
6727173 Semiconductor processing methods of forming an utilizing antireflective material layers, and methods of forming transistor gate stacks Gurtej S. Sandhu 2004-04-27
6706116 Method of forming a crystalline phase material Gurtej S. Sandhu 2004-03-16
6706158 Electrochemical mechanical planarization 2004-03-16
6705246 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition Gurtej S. Sandhu, Paul Smith, Mei Chang 2004-03-16
6696368 Titanium boronitride layer for high aspect ratio semiconductor devices Ammar Derraa, Paul Castrovillo 2004-02-24
6686288 Integrated circuit having self-aligned CVD-tungsten/titanium contact plugs strapped with metal interconnect and method of manufacture Kirk D. Prall, Howard E. Rhodes, Gurtel Sandhu, Philip J. Ireland 2004-02-03