Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6815308 | Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates | Niroomand Ardavan | 2004-11-09 |
| 6812129 | Reticle for creating resist-filled vias in a dual damascene process | — | 2004-11-02 |
| 6768213 | Automated combi deposition apparatus and method | Ziad R. Hatab, David Q. Wright | 2004-07-27 |
| 6756167 | Overlay target design method to minimize impact of lens aberrations | Pary Baluswamy | 2004-06-29 |