Issued Patents 2004
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6821689 | Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature | — | 2004-11-23 |
| 6822848 | Dynamic random access memory (DRAM) circuitry | Martin C. Roberts | 2004-11-23 |
| 6811935 | Phase shift mask layout process for patterns including intersecting line segments | — | 2004-11-02 |
| 6808850 | Performing optical proximity correction on trim-level segments not abutting features to be printed | — | 2004-10-26 |
| 6807663 | Accelerated layout processing using OPC pre-processing | Michel Cote, Philippe Hurat | 2004-10-19 |
| 6797441 | Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask | — | 2004-09-28 |
| 6795168 | Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process | Yao-Ting Wang, Fang-Cheng Chang | 2004-09-21 |
| 6792590 | Dissection of edges with projection points in a fabrication layout for correcting proximity effects | Youping Zhang | 2004-09-14 |
| 6792592 | Considering mask writer properties during the optical proximity correction process | Danny Keogan | 2004-09-14 |
| 6787271 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2004-09-07 |
| 6785879 | Model-based data conversion | — | 2004-08-31 |
| 6777141 | Phase shift mask including sub-resolution assist features for isolated spaces | — | 2004-08-17 |
| 6777138 | Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout | Youping Zhang | 2004-08-17 |
| 6753115 | Facilitating minimum spacing and/or width control optical proximity correction | Youping Zhang | 2004-06-22 |
| 6745372 | Method and apparatus for facilitating process-compliant layout optimization | Michel Cote, Philippe Hurat | 2004-06-01 |
| 6733929 | Phase shift masking for complex patterns with proximity adjustments | — | 2004-05-11 |
| 6721928 | Verification utilizing instance-based hierarchy management | Chin-Hsen Lin, Fang-Cheng Chang, Yao-Ting Wang | 2004-04-13 |
| 6721938 | Optical proximity correction for phase shifting photolithographic masks | Michel Cote | 2004-04-13 |
| 6717201 | Capacitor structure | Martin C. Roberts | 2004-04-06 |
| 6681379 | Phase shifting design and layout for static random access memory | Michel Cote | 2004-01-20 |
| 6673670 | Method of forming a capacitor structure and DRAM circuitry having a capacitor structure including interior areas spaced apart from one another in a non-overlapping relationship | Martin C. Roberts | 2004-01-06 |