Issued Patents 2004
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6770214 | Method of reducing aluminum fluoride deposits in plasma etch reactor | Yousun Kim, Anthony Chen, John Daugherty | 2004-08-03 |
DO
Duane Outka
Overall (2004): #230,824 of 270,089Top 90%
1
Patents 2004