Issued Patents 2004
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE38674 | Process for forming a thin oxide layer | William Hargrove, Leopoldo D. Yau | 2004-12-21 |
| 6825506 | Field effect transistor and method of fabrication | Doulgas Barlage, Been-Yih Jin | 2004-11-30 |
| 6812086 | Method of making a semiconductor transistor | Anand S. Murthy, Boyan Boyanov, Ravindra Soman | 2004-11-02 |
| 6809017 | Interfacial layer for gate electrode and high-k dielectric layer and methods of fabrication | Reza Arghavani, Mark L. Doczy, Brian Roberds | 2004-10-26 |
| 6797556 | MOS transistor structure and method of fabrication | Anand S. Murthy, Patrick Morrow | 2004-09-28 |
| 6787440 | Method for making a semiconductor device having an ultra-thin high-k gate dielectric | Christopher Parker, Markus Kuhn, Ying Zhou, Scott A. Hareland, Suman Datta +4 more | 2004-09-07 |
| 6777759 | Device structure and method for reducing silicide encroachment | Ebrahim Andideh, Mitch Taylor, Chia-Hong Jan, Julie Tsai | 2004-08-17 |
| 6765273 | Device structure and method for reducing silicide encroachment | Ebrahim Andideh, Mitch Taylor, Chia-Hong Jan, Julie Tsai | 2004-07-20 |
| 6713358 | Method for making a semiconductor device having a high-k gate dielectric | Timothy E. Glassman, Christopher Parker, Matthew V. Metz, Lawrence Foley, Reza Arghavani +1 more | 2004-03-30 |
| 6696327 | Method for making a semiconductor device having a high-k gate dielectric | Justin K. Brask, Mark L. Doczy, John Barnak | 2004-02-24 |
| 6696345 | Metal-gate electrode for CMOS transistor applications | Mark L. Doczy, Brian S. Doyle, Jack T. Kavalieros | 2004-02-24 |