MH

Morio Hosoya

HO Hoya: 2 patents #10 of 112Top 9%
📍 Shinjuku, JP: #3 of 31 inventorsTop 10%
Overall (2004): #48,680 of 270,089Top 20%
2
Patents 2004

Issued Patents 2004

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6749973 Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask Tsutomu Shoki 2004-06-15
6737201 Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device Tsutomu Shoki 2004-05-18