Issued Patents 2004
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6821683 | METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PHOTOMASK FABRICATED USING THE CORRECTED DESIGN PATTERN DATA, A METHOD FOR INSPECTING THE PHOTOMASK AND A METHOD FOR GENERATING PATTERN DATA FOR INSPECTION OF PHOTOMASK | Nobuhito Toyama, Naoki Shimohakamada | 2004-11-23 |