NT

Nobuhito Toyama

Dai Nippon Printing Co.: 2 patents #19 of 250Top 8%
Overall (2004): #47,553 of 270,089Top 20%
2
Patents 2004

Issued Patents 2004

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6821683 METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PHOTOMASK FABRICATED USING THE CORRECTED DESIGN PATTERN DATA, A METHOD FOR INSPECTING THE PHOTOMASK AND A METHOD FOR GENERATING PATTERN DATA FOR INSPECTION OF PHOTOMASK Naoki Shimohakamada, Wakahiko Sakata 2004-11-23
6694500 Design circuit pattern for test of semiconductor circuit 2004-02-17