Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6809794 | Immersion photolithography system and method using inverted wafer-projection optics interface | — | 2004-10-26 |
| 6800408 | Use of multiple reticles in lithographic printing tools | Andrew W. McCullough, Christopher Mason, Luis Markoya | 2004-10-05 |
| 6757110 | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage | Jorge Ivaldi, John Shamaly | 2004-06-29 |
| 6731374 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system | — | 2004-05-04 |