KW

Karsten Wieczorek

AM AMD: 14 patents #21 of 1,035Top 3%
📍 Fürth, CA: #1 of 2 inventorsTop 50%
Overall (2004): #612 of 270,089Top 1%
14
Patents 2004

Issued Patents 2004

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
6821887 Method of forming a metal silicide gate in a standard MOS process sequence Stephan Kruegel, Manfred Horstmann, Thomas Feudel 2004-11-23
6821840 Semiconductor device including a field effect transistor and a passive capacitor having reduced leakage current and an improved capacitance per unit area Gert Burbach, Thomas Feudel 2004-11-23
6812074 SOI field effect transistor element having a recombination region and method of forming same Manfred Horstmann, Christian Krueger 2004-11-02
6812159 Method of forming a low leakage dielectric layer providing an increased capacitive coupling Falk Graetsch, Lutz Herrmann 2004-11-02
6812115 Method of filling an opening in a material layer with an insulating material Stephan Kruegel, Michael Raab 2004-11-02
6806126 Method of manufacturing a semiconductor component Scott Luning, Thorsten Kammler 2004-10-19
6806153 Method of manufacturing a field effect transistor Manfred Horstmann, Thomas Feudel 2004-10-19
6798028 Field effect transistor with reduced gate delay and method of fabricating the same Manfred Horstmann, Rolf Stephan, Stephan Kruegel 2004-09-28
6770552 Method of forming a semiconductor device having T-shaped gate structure Manfred Horstmann, Rolf Stephan 2004-08-03
6754553 Implant monitoring using multiple implanting and annealing steps Manfred Horstmann, Christian Krueger 2004-06-22
6746927 Semiconductor device having a polysilicon line structure with increased metal silicide portions and method for forming the polysilicon line structure of a semiconductor device Thorsten Kammler, Christof Streck 2004-06-08
6723663 Technique for forming an oxide/nitride layer stack by controlling the nitrogen ion concentration in a nitridation plasma Falk Graetsch, Lutz Herrmann 2004-04-20
6703278 Method of forming layers of oxide on a surface of a substrate Falk Graetsch, Stephan Kruegel 2004-03-09
6673665 Semiconductor device having increased metal silicide portions and method of forming the semiconductor Manfred Horstmann, Rolf Stephan 2004-01-06