TN

Toshimasa Nakayama

TC Tokyo Ohka Kogyo Co.: 3 patents #2 of 69Top 3%
Overall (2003): #20,116 of 273,478Top 8%
3
Patents 2003

Issued Patents 2003

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
6620978 Positive photoresist composition and process for synthesizing polyphenol compound Satoshi Shimatani, Ken Miyagi, Satoshi Niikura, Hidekatsu Kohara 2003-09-16
RE38254 Positive resist composition Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Banba 2003-09-16
6566031 Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern Takako Suzuki, Kousuke Doi, Hidekatsu Kohara 2003-05-20