Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6566031 | Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern | Takako Suzuki, Hidekatsu Kohara, Toshimasa Nakayama | 2003-05-20 |
| 6517993 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Hidekatsu Kohara | 2003-02-11 |