Issued Patents 2003
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6656764 | Process for integration of a high dielectric constant gate insulator layer in a CMOS device | Ming-Fang Wang, Liang-Gi Yao, Shih-Chang Chen | 2003-12-02 |
| 6624090 | Method of forming plasma nitrided gate dielectric layers | Mo Yu, Shih-Chang Chen | 2003-09-23 |
| 6566205 | Method to neutralize fixed charges in high K dielectric | Mo Yu | 2003-05-20 |