Issued Patents 2003
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664013 | Methods of characterizing device performance based upon the duration of an endpointed photoresist develop process, and system for accomplishing same | Christopher A. Bode | 2003-12-16 |
| 6632692 | Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same | Alexander J. Pasadyn, Anthony J. Toprac | 2003-10-14 |
| 6595830 | Method of controlling chemical mechanical polishing operations to control erosion of insulating materials | Gerd Marxsen, Anthony J. Toprac | 2003-07-22 |
| 6588007 | Use of endpoint system to match individual processing stations within a tool | Alexander J. Pasadyn | 2003-07-01 |
| 6576385 | Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness | Christopher A. Bode, Alexander J. Pasadyn | 2003-06-10 |
| 6569692 | Automated method of controlling photoresist develop time to control critical dimensions, and system for accomplishing same | Christopher A. Bode | 2003-05-27 |
| 6534328 | Method of modeling and controlling the endpoint of chemical mechanical polishing operations performed on a process layer, and system for accomplishing same | Alexander J. Pasadyn | 2003-03-18 |