Issued Patents 2003
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6627107 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, Suryadevara V. Babu, William G. America | 2003-09-30 |
| 6616514 | High selectivity CMP slurry | Brian Edelbach, Eric Oswald | 2003-09-09 |
| 6596042 | Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process | Xiangdong Feng | 2003-07-22 |
| 6544892 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, Suryadevara V. Babu, William G. America | 2003-04-08 |