RS

Ramanathan Srinivasan

Eastman Kodak: 2 patents #228 of 898Top 30%
📍 Penn Yan, NY: #1 of 2 inventorsTop 50%
🗺 New York: #1,452 of 9,423 inventorsTop 20%
Overall (2003): #47,160 of 273,478Top 20%
2
Patents 2003

Issued Patents 2003

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6627107 Slurry for chemical mechanical polishing silicon dioxide Suryadevara V. Babu, William G. America, Yie-Shein Her 2003-09-30
6544892 Slurry for chemical mechanical polishing silicon dioxide Suryadevara V. Babu, William G. America, Yie-Shein Her 2003-04-08