HL

Hans Van Der Laan

AB Asml Netherlands B.V.: 2 patents #10 of 64Top 20%
Overall (2003): #65,422 of 273,478Top 25%
2
Patents 2003

Issued Patents 2003

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6650399 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations Johannes Jacobus Matheus Baselmans, Marco Hugo Petrus Moers, Robert Wilhelm Willekers, Wilhelmus Petrus De Boeij, Marcus Adrianus Van De Kerkhof 2003-11-18
6646729 Method of measuring aberration in an optical imaging system Marco Hugo Petrus Moers 2003-11-11