Issued Patents 2002
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492085 | Positive photoresist composition and process and synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Satoshi Niikura, Hidekatsu Kohara | 2002-12-10 |
| 6475694 | Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group | Kousuke Doi, Ken Miyagi, Atsuko Hirata, Hidekatsu Kohara | 2002-11-05 |
| 6417317 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Kousuke Doi, Ryuusaku Takahashi, Hidekatsu Kohara | 2002-07-09 |
| 6406827 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Kousuke Doi, Hidekatsu Kohara | 2002-06-18 |
| 6379859 | Positive photoresist composition and process for forming resist pattern using same | Takako Suzuki, Sachiko Tamura, Kousuke Doi, Hidekatsu Kohara | 2002-04-30 |