Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492085 | Positive photoresist composition and process and synthesizing polyphenol compound | Satoshi Shimatani, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 2002-12-10 |
| 6475694 | Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group | Kousuke Doi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama | 2002-11-05 |
| 6417317 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Kousuke Doi, Ryuusaku Takahashi, Hidekatsu Kohara, Toshimasa Nakayama | 2002-07-09 |