Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475910 | Radical-assisted sequential CVD | — | 2002-11-05 |
| 6451119 | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition | Carl Galewski | 2002-09-17 |
| 6451695 | Radical-assisted sequential CVD | — | 2002-09-17 |