Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6398874 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same | Dong-Jin Park, Jin Ho Hwang, Je-eung Park, Sang-Mun Chon | 2002-06-04 |
| 6337174 | Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide | Mi-sook Jeon, Chun-Deuk Lee, Pil-Kwon Jun | 2002-01-08 |