Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6482744 | Two step plasma etch using variable electrode spacing | — | 2002-11-19 |
| 6423600 | Method for forming uniform oxide thickness | Chuchun Hu | 2002-07-23 |
| 6410403 | Method for planarizing a shallow trench isolation | — | 2002-06-25 |
| 6391705 | Fabrication method of high-density semiconductor memory cell structure having a trench | Chia-Shun Hsiao, Chih-Yu Lee | 2002-05-21 |
| 6391706 | Method for making deep trench capacitors for DRAMs with reduced faceting at the substrate edge and providing a more uniform pad Si3N4layer across the substrate | Sheng Fen Chiu, Jesse Chung, Hsiao-Lei Wang | 2002-05-21 |
| 6355518 | Method for making a DRAM cell with deep-trench capacitors and overlying vertical transistors | Chia-Shun Hsiao | 2002-03-12 |