HL

Hsiu-Hsiang Lin

TSMC: 1 patents #199 of 614Top 35%
📍 Hengshan, NY: #1 of 1 inventorsTop 100%
Overall (2002): #203,044 of 266,432Top 80%
1
Patents 2002

Issued Patents 2002

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6436839 Increasing programming silicide process window by forming native oxide film on amourphous Si after metal etching Chi Kang Liu, Kang-Hei Chang 2002-08-20