Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6485869 | Photomask frame modification to eliminate process induced critical dimension control variation | Wilman Tsai, Marilyn Kamna, Frederick Chen | 2002-11-26 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6485869 | Photomask frame modification to eliminate process induced critical dimension control variation | Wilman Tsai, Marilyn Kamna, Frederick Chen | 2002-11-26 |