Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6368189 | Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure | Gerard S. Maloney, Scott Chin, Jiro Kajiwara, Malek Charif | 2002-04-09 |