Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6432828 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Shumin Wang | 2002-08-13 |
| 6362106 | Chemical mechanical polishing method useful for copper substrates | Rodney Kistler, Shumin Wang | 2002-03-26 |